US Patent Issued to ASML Netherlands on April 15 for "Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method" (Dutch Inventors)

ALEXANDRIA, Va., June 5 -- United States Patent no. 12,276,921, issued on April 15, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method" was invented by Olger Victor Zwier (Eindhoven, Netherlands), Maurits Van Der Schaar (Eindhoven, Netherlands), Hilko Dirk Bos (Utrecht, Netherlands), Hans Van Der Laan (Veldhoven, Netherlands), S. M. Masudur Rahman Al Arif (Veldhoven, Netherlands), Henricus Wilhelmus Maria Van Buel ('s-Hertogenbosch, Netherlands), Armand Eugene Albert Koolen (Nuth, Netherlands), Victor Emanuel Calado (Rotterdam, Netherlands), Kaustuve Bhattacharyya (Veldhoven, Netherlands), Jin Lia...