ALEXANDRIA, Va., April 2 -- United States Patent no. 12,265,337, issued on April 1, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Exposure apparatus" was invented by Junichi Kanehara (Eindhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure apparatus arranged to project a radiation beam onto a target portion of a substrate, the exposure apparatus having: a first substrate holder configured to hold the substrate; a second substrate holder configured to hold the substrate; a sensor holder configured to hold a sensor and/or detector; a first measurement device having a first alignment system having an alignment sensor configured to measure positions of a substrate ali...