US Patent Issued to ASML Holding on Sept. 30 for "Multiple objectives metrology system, lithographic apparatus, and methods thereof" (Connecticut Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,780, issued on Sept. 30, was assigned to ASML Holding N.V. (Veldhoven, Netherlands).

"Multiple objectives metrology system, lithographic apparatus, and methods thereof" was invented by Douglas C. Cappelli (Norwalk, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology or inspection system, a lithographic apparatus, and a method are provided. The system includes an illumination system, an optical system, a first optical device, a second optical device, a detector, and a processor. The optical system is configured to split an illumination beam into a first sub-beam and a second sub-beam. The first optical device is configured to receive th...