US Patent Issued to ASML HOLDING on June 10 for "Lithographic apparatus, metrology system, and intensity imbalance measurement for error correction" (Connecticut Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,326,670, issued on June 10, was assigned to ASML HOLDING N.V. (Veldhoven, Netherlands).

"Lithographic apparatus, metrology system, and intensity imbalance measurement for error correction" was invented by Earl William Ebert (Oxford, Conn.) and Roxana Rezvani Naraghi (Easton, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology system includes a beam splitter and first and second sensors. The beam splitter splits scattered radiation scattered by a target into first and second portions of radiation. The first sensor receives the first portion. The second sensor receives the second portion after the second portion propagates along a path that i...