US Patent Issued to ASML Holding on Jan. 27 for "Lithographic apparatus, locking device, and method" (Connecticut Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,535,745, issued on Jan. 27, was assigned to ASML Holding N.V. (Veldhoven, Netherlands).

"Lithographic apparatus, locking device, and method" was invented by Daniel Nathan Burbank (Ridgefield, Conn.) and Andi Dine (Stamford, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A lithographic apparatus includes an illumination system to illuminate a pattern of a patterning device, a projection system to project an image of the pattern onto a substrate, a movable stage to support the patterning device or the substrate, a slotted object, and a locking device (700) to prevent a motion of the movable stage. The locking device comprises an actuator (702) and a...