ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,529,963, issued on Jan. 20, was assigned to ASML Holding N.V. (Veldhoven, Netherlands).
"Fast uniformity drift correction" was invented by Roberto B. Wiener (Ridgefield, Conn.), Kalyan Kumar Mankala (Bethel, Conn.) and Todd R. Downey (Monroe, Conn.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Systems, apparatuses, and methods are provided for adjusting illumination slit uniformity in a lithographic apparatus. An example method can include irradiating, by a radiation source, a portion of a finger assembly with radiation. The example method can further include receiving, by a radiation detector, at least a portion of the radiation in response to the irr...