US Patent Issued to ASML Holding on Aug. 26 for "Systems and methods for measuring intensity in a lithographic alignment apparatus" (Connecticut Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,399,000, issued on Aug. 26, was assigned to ASML Holding N.V. (Veldhoven, Netherlands).

"Systems and methods for measuring intensity in a lithographic alignment apparatus" was invented by Mohamed Swillam (Wilton, Conn.), Justin Lloyd Kreuzer (Trumbull, Conn.), Stephen Roux (New Fairfield, Conn.), Michael Leo Nelson (Redding, Conn.) and Muhsin Eralp (Bethel, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology system includes a radiation source, an adjustable diffractive element, an optical system, an optical element, and a processor. The radiation source generates radiation. The adjustable diffractive element diffracts the radiation to gener...