US Patent Issued to ASML Holding on Aug. 19 for "Sub micron particle detection on burl tops by applying a variable voltage to an oxidized wafer" (Connecticut Inventor)

ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,393,126, issued on Aug. 19, was assigned to ASML Holding N.V. (Veldhoven, Netherlands).

"Sub micron particle detection on burl tops by applying a variable voltage to an oxidized wafer" was invented by Tammo Uitterdijk (Wilton, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems, apparatuses, methods, and computer program products are provided for determining a free form flatness of a substrate table. An example system can include a substrate table that includes a first substrate table surface and a grounded substrate table electrical connection configured to ground the substrate table. The system can further include a substrate that includes a ...