US Patent Issued to ASML Holding on April 29 for "Polarization selection metrology system, lithographic apparatus, and methods thereof" (Connecticut Inventor)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,585, issued on April 29, was assigned to ASML Holding N.V. (Veldhoven, Netherlands).

"Polarization selection metrology system, lithographic apparatus, and methods thereof" was invented by Douglas C. Cappelli (Norwalk, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An inspection system, a lithographic apparatus, and a method are provided. The inspection system includes an illumination system, an optical system, a shutter system, an objective system and a detector. The illumination system is configured to generate an illumination beam. The optical system is configured to split the illumination beam into a first sub-beam and a second sub-beam. The...