US Patent Issued to ASML Holding, ASML Netherlands on Oct. 14 for "Contaminant analyzing metrology system, lithographic apparatus, and methods thereof" (Dutch, American Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,442,759, issued on Oct. 14, was assigned to ASML Holding N.V. (Veldhoven, Netherlands) and ASML Netherlands B.V. (Veldhoven, Netherlands).

"Contaminant analyzing metrology system, lithographic apparatus, and methods thereof" was invented by Michal Emanuel Pawlowski (Norwalk, Conn.), Aage Bendiksen (Fairfield, Conn.), Christopher Michael Dohan (Redding, Conn.) and Johannes Onvlee ('s-Hertogenbosch, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "An inspection system, a lithography apparatus, and an inspection method are provided. The inspection system includes an illumination system, a detection system, and processing circuitry. The illuminati...