US Patent Issued to ASML HOLDING, ASML NETHERLANDS on May 20 for "Metrology tool with position control of projection system" (Dutch, American Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,544, issued on May 20, was assigned to ASML HOLDING N.V. (Veldhoven, Netherlands) and ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Metrology tool with position control of projection system" was invented by Hans Butler (Best, Netherlands), Arie Jeffrey Den Boef (Waalre, Netherlands), Mark Constant Johannes Baggen (Eindhoven, Netherlands), Jeroen Arnoldus Leonardus Johannes Raaymakers (Oirschot, Netherlands) and Richard Carl Zimmerman (Brookfield, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology tool that includes a substrate table to hold a substrate; a projection system configured to project a beam on a target portion of the subs...