US Patent Issued to ASML HOLDING, ASML NETHERLANDS on June 24 for "Optimization using a non-uniform illumination intensity profile" (American, Dutch Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,339,583, issued on June 24, was assigned to ASML HOLDING N.V. (Veldhoven, Netherlands) and ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Optimization using a non-uniform illumination intensity profile" was invented by Janardan Nath (Norwalk, Conn.), Christopher John Mason (Newtown, Conn.), Duan-Fu Stephen Hsu (Fremont, Calif.), Todd R. Downey (Monroe, Conn.) and Tian Gang (Best, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for source mask optimization or mask only optimization used to image a pattern onto a substrate. The method includes determining a non-uniform illumination intensity profile for illumination; and determining ...