US Patent Issued to ASML Holding, ASML Netherlands on June 17 for "Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris" (Dutch, American Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,332,570, issued on June 17, was assigned to ASML Holding N.V. (Veldhoven, Netherlands) and ASML Netherlands B.V. (Veldhoven, Netherlands).

"Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris" was invented by Ronald Peter Albright (Norwalk, Conn.), Kursat Bal (Arnhem, Netherlands), Vadim Yevgenyevich Joseph Banine (Deurne, Netherlands), Richard Joseph Bruls (Eindhoven, Netherlands), Sjoerd Frans De Vries (Eindhoven, Netherlands), Olav Waldemar Vladimir Frijns (Rosmalen, Netherlands), Yang-Shan Huang (Veldhoven, Netherlands), Zhuangxiong Huang (Eindhoven, Netherlands), Johannes Henricus Wilhelmus Jacobs (Heeze, Netherlands), Johannes...