US Patent Issued to ASM IP Holding on Sept. 30 for "Topology-selective deposition method and structure formed using same" (Belgian Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,428,728, issued on Sept. 30, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Topology-selective deposition method and structure formed using same" was invented by Timothee Blanquart (Oud-Heverlee, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "A topology-selective deposition method is disclosed. An exemplary method includes depositing a first layer of material overlying a gap or feature on a substrate surface, depositing a second layer of material overlying the first layer of material, and selectively removing the first layer of material."

The patent was filed on Sept. 5, 2022, under Application No. 17/902,957.

*For further inform...