ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,417,933, issued on Sept. 16, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Wafer far edge temperature measurement system with lamp bank alignment" was invented by Rutvij Naik (Tempe, Ariz.), Shujin Huang (Tempe, Ariz.), Junwei Su (Tempe, Ariz.) and Xing Lin (Chandler, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A reactor system designed to provide accurate monitoring of wafer temperatures during deposition steps. The reactor system includes a pyrometer mounting assembly supporting and positioning three or more pyrometers (e.g., infrared (IR) pyrometers) relative to the reaction chamber to measure a center wafer temperature and an...