US Patent Issued to ASM IP Holding on Sept. 16 for "Substrate processing apparatus" (South Korean Inventor)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,083, issued on Sept. 16, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Substrate processing apparatus" was invented by YongSeok Oh (Chungju-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus may be presented. The apparatus comprising a reaction chamber configured to hold a substrate, a deposition system to deposit a layer on the substrate according to a recipe, an automatic deposition compensation system comprising a calculator programmed: to calculate an accumulated layer thickness (x) deposited on the inside of the reaction chamber by the deposition system as a function of the recipes run...