ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,081, issued on Sept. 16, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Manifolds for uniform vapor deposition" was invented by David Marquardt (Scottsdale, Ariz.), Andrew Michael Yednak III (Phoenix), Eric James Shero (Phoenix) and Herbert Terhorst (Amersfoort, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device comprising a manifold for uniform vapor deposition is disclosed. The semiconductor device can include a manifold comprising a bore and having an inner wall. The inner wall can at least partially define the bore. A first axial portion of the bore can extend along a longitudinal axis of the manifold...