US Patent Issued to ASM IP Holding on Oct. 28 for "Method and apparatus for forming a patterned structure on a substrate" (Belgian, American, Finnish Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,454,752, issued on Oct. 28, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Method and apparatus for forming a patterned structure on a substrate" was invented by Shaoren Deng (Ghent, Belgium), David Kurt de Roest (Leuven, Belgium), Vincent Vandalon (Heverlee, Belgium), Anirudhan Chandrasekaran (Scottsdale, Ariz.), Yonggyu Han (Leuven, Belgium) and Marko Tuominen (Helsinki).

According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosure relates to the manufacture of semiconductor devices, especially to methods and processing assemblies for forming a patterned structure on a substrate. The methods comprise providing the substrate comprising a fi...