ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,599, issued on Oct. 14, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Method for forming an ultraviolet radiation responsive metal oxide-containing film" was invented by Hannu Huotari (Espoo, Finland) and Jan Willem Maes (Wilrijk, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming ultraviolet (UV) radiation responsive metal-oxide containing film is disclosed. The method may include, depositing an UV radiation responsive metal oxide-containing film over a substrate by, heating the substrate to a deposition temperature of less than 400deg C., contacting the substrate with a first vapor phase reactant comprising a...