ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,442,076, issued on Oct. 14, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Method and system for depositing noble metal-containing layer" was invented by Timo Hatanpaa (Espoo, Finland), Anton Vihervaara (Helsinki) and Mikko Ritala (Espoo, Finland).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to methods and apparatuses for depositing noble metal-containing material on a substrate by a cyclic deposition process. The method comprises providing a substrate in a reaction chamber, providing a noble metal precursor into the reaction chamber in a vapor phase; and providing a second precursor into the reaction chamber...