ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,482,648, issued on Nov. 25, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Selective passivation and selective deposition" was invented by Jan Willem Maes (Wilrijk, Belgium), Michael Eugene Givens (Helsinki), Suvi P. Haukka (Helsinki), Vamsi Paruchuri (Mesa, Ariz.), Ivo Johannes Raaijmakers (Bilthoven, Netherlands), Shaoren Deng (Ghent, Belgium), Andrea Illiberi (Leuven, Belgium), Eva E. Tois (Espoo, Finland), Delphine Longrie (Ghent, Belgium), Charles Dezelah (Helsinki) and Marko Tuominen (Helsinki).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for selective deposition are provided. Material is selectively deposited on a first surf...