ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,467,143, issued on Nov. 11, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Substrate processing device" was invented by SungBae Kim (Yongin-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing device capable of detecting a gas leakage includes at least one reactor; a gas supply unit configured to supply a gas to the reactor; and a detection unit connected to the gas supply unit, wherein the detection unit is configured to detect a gas flow in the gas supply unit."
The patent was filed on Feb. 11, 2022, under Application No. 17/670,127.
*For further information, including images, charts and tables, please v...