ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,695, issued on Nov. 11, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Methods and systems for forming a layer comprising vanadium and nitrogen" was invented by Giuseppe Alessio Verni (Jodoigne, Belgium), Ren-Jie Chang (Leuven, Belgium), Qi Xie (Wilsele, Belgium), Timothee Blanquart (Oud-Heverlee, Belgium) and Eric Shero (Phoenix).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are methods and systems for depositing layers comprising a metal and nitrogen. The layers are formed onto a surface of a substrate. The deposition process may be a cyclical deposition process. Exemplary structures in which the layers may be incorporated i...