ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,467,141, issued on Nov. 11, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Injector configured for arrangement within a reaction chamber of a substrate processing apparatus" was invented by Lucian C. Jdira (Nieuw Vennep, Netherlands) and Chris G.M. de Ridder (Hoogland, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to an injector configured for arrangement within a reaction chamber of a substrate processing apparatus to inject gas in the reaction chamber. The injector may be elongated along a first axis and configured with an internal gas conduction channel extending along the first axis and provided with a...