ALEXANDRIA, Va., June 12 -- United States Patent no. 12,297,533, issued on May 13, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Liquid precursor vapor pressure control" was invented by Michael Schmotzer (Chandler, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A source vessel for use in a semiconductor processing system to supply precursor materials by providing enhanced control over vapor pressures. The source vessel includes a housing or vessel defining a chamber for holding a volume of precursor in a liquid state. The source vessel further includes a temperature sensor configured to detect a temperature of a surface of the liquid-state precursor that is presently contained within the ...