ALEXANDRIA, Va., March 5 -- United States Patent no. 12,243,747, issued on March 4, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Methods of forming structures including vanadium boride and vanadium phosphide layers" was invented by Petro Deminskyi (Helsinki), Charles Dezelah (Helsinki), Jiyeon Kim (Phoenix), Giuseppe Alessio Verni (Ottignies, Belgium), Maart Van Druenen (Helsinki), Qi Xie (Wilsele, Belgium) and Petri Raisanen (Gilbert, Ariz.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for depositing a layer, comprising one or more of vanadium boride and vanadium phosphide, onto a surface of a substrate and structures and devices formed using the methods are disclosed. An...