ALEXANDRIA, Va., March 5 -- United States Patent no. 12,241,156, issued on March 4, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Combination CVD/ALD method, source and pulse profile modification" was invented by Hannu Huotari (Espoo, Finland) and Tom E. Blomberg (Vantaa, Finland).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates generally to methods and apparatus for the controlled growing of material on substrates. According to embodiments of the present invention, a precursor feed is controlled in order to provide an optimal pulse profile. This may be accomplished by splitting the feed into two paths. One of the paths is restricted in a continuous manner. The other ...