ALEXANDRIA, Va., March 19 -- United States Patent no. 12,252,785, issued on March 18, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Method for cleaning quartz epitaxial chambers" was invented by Gregory Deye (Phoenix), Joseph P. Margetis (Gilbert, Ariz.) and John Tolle (Gilbert, Ariz.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of cleaning an epitaxial reaction chamber in-situ is disclosed. The method may include a pre-coating step, a high temperature baking step, and a gas etching step. The method is able to remove residue buildup within the reaction chamber, which may be made of quartz."
The patent was filed on May 29, 2020, under Application No. 16/888,423.
*For further informa...