US Patent Issued to ASM IP Holding on June 3 for "Substrate processing apparatus including gas diffusion nozzle" (Japanese Inventor)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,320,003, issued on June 3, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Substrate processing apparatus including gas diffusion nozzle" was invented by Daiki Nojiri (Tama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus unit is disclosed. Exemplary substrate processing apparatus includes a reaction chamber; a susceptor disposed in the reaction chamber and configured to support a substrate; a shower plate provided above the susceptor; a gas transport tube positioned above the shower plate and in fluid communication with the reaction chamber; and a gas supply tube connected to the gas transport tube throu...