ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,593, issued on June 3, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Selective passivation and selective deposition" was invented by Jan Willem Hub Maes (Wilrijk, Belgium), Michael Eugene Givens (Oud-Heverlee, Belgium), Suvi P. Haukka (Helsinki), Vamsi Paruchuri (Mesa, Ariz.), Ivo Johannes Raaijmakers (Amersfoort, Netherlands), Shaoren Deng (Ghent, Belgium), Andrea Illiberi (Leuven, Belgium), Eva E. Tois (Espoo, Finland), Delphine Longrie (Ghent, Belgium) and Viljami J. Pore (Helsinki).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for selective deposition are provided. Material is selectively deposited on a first surface of a su...