ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,575, issued on June 3, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Etching processes and processing assemblies" was invented by Bablu Mukherjee (Nagoya, Japan), Rene Henricus Jozef Vervuurt (Leuven, Belgium), Takayoshi Tsutsumi (Nagoya, Japan), Nobuyoshi Kobayashi (Kawagoe, Japan) and Masaru Hori (Nissin, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The current disclosure relates to methods of selectively etching material from a first surface of a substrate relative to a second surface of the substrate. The method includes providing the substrate having a first surface comprising an etchable material, and a second surface comp...