ALEXANDRIA, Va., July 16 -- United States Patent no. 12,362,174, issued on July 15, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Method and wafer processing furnace for forming an epitaxial stack on a plurality of substrates" was invented by Steven Van Aerde (Tielt-Winge, Belgium), Wilco Verweij (Nijkerk, Belgium), Bert Jongbloed (Oud-Heverlee, Belgium), Dieter Pierreux (Pepingen, Belgium), Kelly Houben (Lubbeek, Belgium), Rami Khazaka (Leuven, Belgium), Frederick Aryeetey (Phoenix), Peter Westrom (Payson, Ariz.), Omar Elleuch (Litchfield Park, Ariz.) and Caleb Miskin (Mesa, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and a wafer processing furnace for forming an epitaxial st...