US Patent Issued to ASM IP Holding on July 1 for "Methods and systems for topography-selective depositions" (Japanese, Belgian Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,675, issued on July 1, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Methods and systems for topography-selective depositions" was invented by Akiko Kobayashi (Inagi, Japan), Rene Henricus Jozef Vervuurt (Leuven, Belgium), Nobuyoshi Kobayashi (Kawagoe, Japan), Takayoshi Tsutsumi (Nagoya, Japan) and Masaru Hori (Nissin, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and related systems for topographically depositing a material on a substrate are disclosed. The substrate comprises a proximal surface and a gap feature. The gap feature comprises a sidewall and a distal surface. Exemplary methods comprise, in the given order: a...