ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,522,916, issued on Jan. 13, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Systems and methods for processing a silicon surface using multiple radical species" was invented by Gregory Deye (Phoenix), Caleb Miskin (Mesa, Ariz.), Hichem M'Saad (Paradise Valley, Ariz.), Steven Reiter (Phoenix), Alexandros Demos (Scottsdale, Ariz.) and Fei Wang (Phoenix).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of processing a silicon surface includes using a first radical species to remove contamination from the surface and to roughen the surface; and using a second radical species to smooth the roughened surface. Reaction systems for performing ...