US Patent Issued to ASM IP Holding on Jan. 13 for "Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures" (Belgian, American Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,451, issued on Jan. 13, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures" was invented by Fu Tang (Gilbert, Ariz.), Delphine Longrie (Ghent, Belgium) and Peng-Fu Hsu (Scottsdale, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for depositing an oxide film on a substrate by a cyclical deposition is disclosed. The method may include: depositing a metal oxide film over the substrate utilizing at least one deposition cycle of a first sub-cycle of the cyclical deposition process; and depositing a silicon oxide film d...