US Patent Issued to ASM IP Holding on Feb. 4 for "Method of manufacturing semiconductor device, and substrate treatment apparatus using ether-CAT" (Japanese Inventor)

ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,217,946, issued on Feb. 4, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Method of manufacturing semiconductor device, and substrate treatment apparatus using ether-CAT" was invented by Taku Omori (Akishima, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Examples of a method of manufacturing a semiconductor device includes, in treatment of a substrate with the use of a plasma, acquiring an RF waveform from a reactor through an Ether CAT in real time, the RF waveform being a waveform relating to an electric power to be applied to an RF plate, and adjusting, by using the RF waveform, the electric power to be applied to the RF plate."

T...