ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,543,519, issued on Feb. 3, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Vapor deposition processes and a deposition assembly" was invented by Georgi Popov (Helsinki), Alexander Weiss (Vantaa, Finland), Mikko Ritala (Espoo, Finland) and Marianna Kemell (Helsinki).

According to the abstract* released by the U.S. Patent & Trademark Office: "The current disclosure relates to a method of depositing a metal halide-comprising material on a substrate by a cyclic deposition process. The method comprises providing a substrate in a reaction chamber, providing a metal precursor into the reaction chamber in a vapor phase and providing a halogen precursor into the reaction chamber in...