ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,506,021, issued on Dec. 23, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Substrate processing apparatus" was invented by SungHoon Jun (Hwaseong-si, South Korea) and ByeongPil Park (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A top lid capable of minimizing thermal deformation when a substrate processing temperature increases includes a support for supporting the top lid, the support protruding integrally from one surface of the top lid."
The patent was filed on Aug. 22, 2022, under Application No. 17/892,780.
*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/n...