ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,378,665, issued on Aug. 5, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"High temperature coatings for a preclean and etch apparatus and related methods" was invented by Peipei Gao (Tempe, Ariz.), Xing Lin (Chandler, Ariz.), Alexandros Demos (Scottsdale, Ariz.), Chuang Wei (Chandler, Ariz.), Wentao Wang (Phoenix), Mingyang Ma (Phoenix) and Prajwal Nagaraj (Tempe, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A coating and a method to form the coating is proposed for a semiconductor film pre-clean and etch apparatus. The coating may be employed in environments where it is difficult to use a traditional coating or coating method. The c...