US Patent Issued to ASM IP Holding B. V. on Sept. 30 for "Method and system for forming patterned features on a surface of a substrate using a plasma-enhanced cyclical deposition process" (South Korean, Japanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,431,355, issued on Sept. 30, was assigned to ASM IP Holding B. V. (Almere, Netherlands).

"Method and system for forming patterned features on a surface of a substrate using a plasma-enhanced cyclical deposition process" was invented by Seunghyun Lee (Tokyo), Yeahyun Gu (Hwaseong-si, South Korea), Hyunchul Kim (Hwaseong-si, South Korea) and Naoki Inoue (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of forming patterned features on a surface of a substrate are disclosed. Exemplary methods include using a plasma-enhanced cyclical deposition process to form a transformable layer including a first material and exposing the transformable layer...