ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,540,401, issued on Feb. 3, was assigned to Ascentool Inc. (Palo Alto, Calif.).

"Large capacity deposition system" was invented by George Xinsheng Guo (Palo Alto, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma deposition apparatus includes a vacuum chamber, and a workpiece assembly that includes a frame that can hold a plurality of workpieces, and gas channels formed in between the workpieces and the frames. The gas channels can transport gas from a gas source to the plurality of workpieces to produce material deposition on the workpieces. The workpiece assembly can form a cylinder in the vacuum chamber."

The patent was filed on July 24, ...