US Patent Issued to Arradiance on Feb. 4 for "Gas manifold for simultaneous gas property control in deposition systems" (Massachusetts Inventors)

ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,215,423, issued on Feb. 4, was assigned to Arradiance LLC (Littleton, Mass.).

"Gas manifold for simultaneous gas property control in deposition systems" was invented by David R. Beaulieu (Groton, Mass.), Jeffrey D. McHugh (Maynard, Mass.), Michael D. Trotter (Bolton, Mass.) and Darith Kong (Lowell, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gas manifold includes a gas inlet surface having a first and second gas input port and a gas outlet surface. A first internal chamber is coupled to the first gas input port. A first plurality of gas conduits, each including an input coupled to the first internal chamber and an outlet at the gas outlet surf...