US Patent Issued to ARMY ACADEMY OF ARMORED FORCES OF PLA on Nov. 25 for "Method and system for optimizing first-diffraction-order reconstruction of holograms, device and medium" (Chinese Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,481,244, issued on Nov. 25, was assigned to ARMY ACADEMY OF ARMORED FORCES OF PLA (Beijing).

"Method and system for optimizing first-diffraction-order reconstruction of holograms, device and medium" was invented by Xingpeng Yan (Beijing), Xinlei Liu (Beijing), Xiaoyu Jiang (Beijing), Xi Wang (Beijing), Tao Jing (Beijing), Cheng Song (Beijing) and Junhui Liu (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and system for optimizing first-diffraction-order reconstruction of holograms, a device, and a medium are provided. The method includes: acquiring a target image; determining a target image light field according to the target image; cal...