US Patent Issued to Applied Materials on Sept. 9 for "Integrated low k recovery and ALD metal deposition process for advanced technology node" (California Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,410,523, issued on Sept. 9, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Integrated low k recovery and ALD metal deposition process for advanced technology node" was invented by Shinjae Kwon (Santa Clara, Calif.), Xinyi Lu (Santa Clara, Calif.), Fredrick Kim (Santa Clara, Calif.), Bo Xie (San Jose, Calif.), Chi-I Lang (Cupertino, Calif.), Li-Qun Xia (Santa Clara, Calif.) and Han Wang (Palo Alto, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "In some embodiments, a method includes positioning a substrate within a processing chamber. The substrate includes a first low-k film having a first water contact angle. The first low-k fil...