US Patent Issued to Applied Materials on Sept. 30 for "Self-assembled monolayer for selective deposition" (California Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,431,387, issued on Sept. 30, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Self-assembled monolayer for selective deposition" was invented by Xiangjin Xie (Fremont, Calif.) and Kevin Kashefi (San Ramon, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for selectively depositing a self-assembled monolayer (SAM) on metallic surfaces are disclosed. Some embodiments of the disclosure utilize phenanthroline or a phenanthroline derivative to form the self-assembled monolayer. Some embodiments selective form the self-assembled monolayer on tungsten or molybdenum. Some embodiments utilize the self-assembled monolayer to selectivel...