ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,418, issued on Sept. 30, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).
"Phase-resolved optical metrology for substrates" was invented by Nedal Saleh (San Jose, Calif.), Zhiming Jiang (Pleasanton, Calif.), Xiaodong Zhang (Sunnyvale, Calif.) and Arun Ramaswamy Srivatsa (Fremont, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "The methods and apparatus provide phase-resolved optical metrology for determining qualities of a substrate and films thereon. Transmitted and reflected signals are coupled using both amplitude and phase information to improve the metrology information obtained from film layers on the substrate."
The paten...