US Patent Issued to Applied Materials on Sept. 30 for "Mura reduction method" (California Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,761, issued on Sept. 30, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Mura reduction method" was invented by Douglas Joseph Van Den Broeke (Santa Clara, Calif.) and Chi-Ming Tsai (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system, methods, and a non-transitory computer-readable medium for digital lithography to reduce mura in substrate sections. The boundary lines of the digital lithography need to be invisible. In one example, a system includes a processing unit configured to print a virtual mask file provided by a controller. The controller is configured to receive data and convert the data into a virtual ...