US Patent Issued to Applied Materials on Sept. 30 for "Methods for removing deposits on the surface of a chamber component" (California Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,427,550, issued on Sept. 30, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Methods for removing deposits on the surface of a chamber component" was invented by Tuochuan Huang (Santa Clara, Calif.), Min Shen (Santa Clara, Calif.), Kenneth Chien (Santa Clara, Calif.), Han Wang (Santa Clara, Calif.), Stayce Parmer (Santa Clara, Calif.) and Rynn Wang (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Described herein is a method for removing deposits off a surface of a chamber component. The method includes receiving a chamber component, and fixing the chamber component in a fixture. A slurry is then applied to a surface o...