US Patent Issued to Applied Materials on Sept. 30 for "Methods and materials for enhanced barrier performance and reduced via resistance" (California Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,431,358, issued on Sept. 30, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Methods and materials for enhanced barrier performance and reduced via resistance" was invented by Lu Chen (Cupertino, Calif.), Seshadri Ganguli (Sunnyvale, Calif.), Sang Ho Yu (Cupertino, Calif.) and Feng Chen (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the disclosure relate to methods and materials for forming barrier layers with enhanced barrier performance and/or reduced via resistance. Some embodiments of the disclosure provide methods for passivating a metal surface by exposing the metal surface to a metal complex compri...