US Patent Issued to APPLIED MATERIALS on Sept. 2 for "Self field-suppression CVD tungsten (W) fill on PVD W liner" (California Inventors)

ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,406,884, issued on Sept. 2, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Self field-suppression CVD tungsten (W) fill on PVD W liner" was invented by Zhimin Qi (Fremont, Calif.), Yi Xu (San Jose, Calif.), Shirish A. Pethe (Cupertino, Calif.), Xingyao Gao (San Jose, Calif.), Shiyu Yue (San Jose, Calif.), Aixi Zhang (Sunnyvale, Calif.), Wei Lei (Campbell, Calif.), Yu Lei (Belmont, Calif.), Geraldine Vasquez (San Jose, Calif.), Dien-yeh Wu (San Jose, Calif.) and Da He (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of methods and associated apparatus for filling a feature in a substrate are provided herein. I...